Material Transition · Public company intelligence

Public company intelligence · evidence-bound public brief

Intel CorporationNASDAQ: INTC

Santa Clara, California, U.S. · Industrial, electronics & aerospace · Semiconductors & batteries

Transition focus Evidence grade A

Intel's material-transition lane is a semiconductor manufacturing system, not a generic waste story: ultrapure water, process chemistry, construction materials and precious-metal-bearing scrap all have to clear fab-quality and recovery controls. Its 2025 Form 10-K says Intel uses fresh and reclaimed water, evaluates waste-upcycling technologies and continues circular-economy work, but does not disclose a public material-grade substitution lane.

Intel's 2025 Form 10-K describes ultrapure water as essential to wafer manufacturing, fresh and reclaimed water in facility systems, and continued work to recover and reuse waste through segregation and supplier technologies. The filing also ties executive and employee performance bonuses to the 95% renewable-electricity target achieved at the end of 2025. Public disclosure does not establish one fab, chemical stream, recovery yield, reclaim specification or approved re-entry route.

Top material flows in

  • Ultrapure water and specialty process chemicals (acids, solvents, photoresists) at wafer fabs
  • Silicon wafers, copper, tungsten and cobalt for interconnect and packaging (directional, sector-level)
  • Specialty gases and slurries used in chemical-mechanical planarization (directional)

Top waste & residual flows

  • 14.7M lb of TRI-listed chemical waste managed across 6 matched U.S. facility leads (2024)
  • Directional residual classes: spent solvents and acids, metal-bearing sludges, wafer/die scrap, electronic scrap
Monitor, no defensible pilot yet Confidence: Low, account-level TRI and revenue scale are confirmed, but no facility-level waste-stream, chemical-identity, or recovery-yield evidence is public

Who controls the physical system

Parent → legal entity → owner → operator → plant, as resolved from public filings.

Legal entity
Intel Corporation (Delaware corporation), NASDAQ: INTC
Headquarters
Santa Clara, California
Key U.S. fabs
Chandler, Arizona (Ocotillo campus, Intel 18A ramped to high-volume manufacturing in 2025) · New Albany, Ohio (under construction, pace slowed on demand/capex reassessment)
Operating status
Owned and operated, both named sites are company fabs, per Intel and trade-press reporting

Financial scale

Scale proxies only, not raw-material purchasing volume unless stated.

Ticker / CIK
INTC / SEC CIK 0000050863
FY2025 revenue
$52.9B, flat year-over-year (reported, FY2025 earnings release)
Arizona (18A)
Ramped to high-volume manufacturing in 2025, Intel's most advanced U.S. process node
Ohio (New Albany)
Construction pace slowed as Intel reassessed demand and capital expenditure

Physical system, in plain terms

Semiconductor fabrication is a physically distinct system from every other account in this batch: silicon wafers move through hundreds of photolithography, etch, deposition and planarization steps, consuming enormous volumes of ultrapure water and specialty process chemicals, acids, solvents, photoresists, and slurries, while depositing copper, tungsten and cobalt interconnects onto the wafer. The residual streams are correspondingly specific: spent solvents and acids requiring hazardous-waste handling, metal-bearing sludges and slurries with reclaimable precious- and specialty-metal content, and wafer or die scrap. Intel's Arizona campus, now running its most advanced 18A process at high volume, and its slower-paced Ohio buildout are the two U.S. sites most likely to generate this profile at scale.